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Sputtering targets

Sputtering targets


A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips. As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.

Otto Chemie Pvt Ltd - Manufacturers of Sputtering targets in India.



 

Sputtering targets

1 to 50 of 107 item(s) displayed

Code Product Name CAS No. MSDS Pricing
A 0611 Aluminium sputtering target, diam. x thickness 50.6 mm × 3 mm, 99.99% 7429-90-5 View
A 3614 Aluminium sputtering target, diam. x thickness 50.8 mm × 3 mm, 99.99% 7429-90-5 View
A 6091 Aluminium sputtering target 99.95% 3 inch dia x 2 mm thick 7429-90-5 View
A 6499 Aluminium sputtering target, diam. x thickness 50 mm × 5 mm, 99.99% 7429-90-5 View
A 8154 Aluminum zinc oxide sputtering target, diam. × thickness 50.8 mm × 3 mm 37275-76-6 View
B 0916 Boron sputtering target, diam. x thickness 4 inch × 3 mm, ≥99.9% 7440-42-8 View
BST 009 Bismuth selenide, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% 12068-69-8 View
BST 018 Bismuth selenide doped with manganese, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Mn) 12068-69-8 View
BST 027 Bismuth selenide doped with copper, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cu) 12068-69-8 View
BST 036 Bismuth selenide doped with iron, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Fe) 12068-69-8 View
BST 045 Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Co) 12068-69-8 View
BST 054 Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cr) 12068-69-8 View
BST 063 Bismuth selenide doped with nickel, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Ni) 12068-69-8 View
BST 072 Bismuth selenide, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% 12068-69-8 View
BST 081 Bismuth selenide doped with manganese, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Mn) 12068-69-8 View
BST 090 Bismuth selenide doped with copper, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cu) 12068-69-8 View
BST 099 Bismuth selenide doped with iron, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Fe) 12068-69-8 View
BST 108 Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Co) 12068-69-8 View
BST 117 Bismuth selenide doped with chromium, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cr) 12068-69-8 View
BST 126 Bismuth selenide doped with nickel, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Ni) 12068-69-8 View
C 0121 Cobalt sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-48-4 View
C 0265 Chromium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99% 7440-47-3 View
C 1051 Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-50-8 View
C 1098 Chromium sputtering target, diam. × thickness 2 in. × 3 mm, 99.99% 7440-47-3 View
C 3299 Chromium sputtering target 99.95% 3 inch dia x 2 mm thick 7440-47-3 View
C 3617 Chromium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-47-3 View
C 4724 Chromium sputtering target, diam. × thickness 2 inch × 3 mm, 99.9% 7440-47-3 View
C 5095 Cobalt sputtering target, diam. x thickness 50.8 mm x 1 mm, 99.95% 7440-48-4 View
C 6567 Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99% 7440-50-8 View
C 6911 Cobalt sputtering target 99.95% 3 inch dia x 2 mm thick -
C 7347 Cobalt sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm , 99.9% 7440-48-4 View
C 7692 Copper sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9% 7440-50-8 View
F 3967 Fe33.3Co33.3Ni33.3 sputtering target 99.95%3 inch dia x 2 mm thick View
F 4599 Fe50Co50 sputtering target 99.95% 3 inch dia x 2 mm thick View
F 8001 Fe88Ga17 sputtering target 99.95% 3 inch dia x 2 mm thick View
F 8691 Fe75Ga25 sputtering target 99.95% 3 inch dia x 2 mm thick -
G 0369 Gold sputtering target, diam. × thickness 2 in. × 0.25 in, 99.99% 7440-57-5 View
G 0396 Gold sputtering target, diam. × thickness 2 in. × 0.125 in, 99.99% 7440-57-5 View
G 0621 Gold sputtering target, diam. × thickness 2 in. × 3 mm, 99.99% 7440-57-5 View
G 0626 Gold sputtering target, diam. × thickness 50 mm × 1 mm, 99.99% 7440-57-5 View
G 0915 Gold sputtering target, diam. × thickness 50 mm × 2 mm, 99.99% 7440-57-5 View
G 0933 Gold sputtering target 99.95% 3 inch dia x 0.5 mm thick 7440-57-5 View
G 0991 Gold sputtering target, diam. × thickness 50.8 mm × 3 mm, 99.99% 7440-57-5 View
G 5679 G 5679 View
G 7308 Gold sputtering target, diam. × thickness 57 mm × 0.1 mm, 99.99% 7440-57-5 View
G 7777 Gold sputtering target, diam. × thickness 2 in. × 1.5 mm, 99.9% 7440-57-5 View
G 8412 Gold sputtering target, diam. × thickness 25.4 mm × 0.2 mm, 99.99% 7440-57-5 View
H 0488 Hafnium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-58-6 View
I 0628 Iron sputtering target, diam. x thickness 50.8 mm x 0.75 mm, 99.95% 7439-89-6 View
I 0658 Indium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm , 99.9% 7440-74-6 View

DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received.
Not for medical, household or any other uses, for lab use only, Please test before use.