Sputtering targets


A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips. As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.

Otto Chemie Pvt Ltd - Manufacturers of Sputtering targets in India.



 

Sputtering targets

1 to 99 of 99 item(s) displayed

Code Product Name CAS No. MSDS Pricing
A 0611 Aluminium sputtering target, diam. x thickness 50.6 mm × 3 mm, 99.99% 7429-90-5 View
A 3614 Aluminium sputtering target, diam. x thickness 50.8 mm × 3 mm, 99.99% 7429-90-5 View
A 6091 Aluminium sputtering target 99.95% 3 inch dia x 2 mm thick 7429-90-5 View
A 6499 Aluminium sputtering target, diam. x thickness 50 mm × 5 mm, 99.99% 7429-90-5 View
A 8154 Aluminum zinc oxide sputtering target, diam. × thickness 50.8 mm × 3 mm 37275-76-6 View
B 0916 Boron sputtering target, diam. x thickness 4 inch × 3 mm, ≥99.9% 7440-42-8 View
BST 009 Bismuth selenide, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% 12068-69-8 View
BST 018 Bismuth selenide doped with manganese, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Mn) 12068-69-8 View
BST 027 Bismuth selenide doped with copper, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cu) 12068-69-8 View
BST 036 Bismuth selenide doped with iron, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Fe) 12068-69-8 View
BST 045 Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Co) 12068-69-8 View
BST 054 Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cr) 12068-69-8 View
BST 063 Bismuth selenide doped with nickel, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Ni) 12068-69-8 View
BST 072 Bismuth selenide, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% 12068-69-8 View
BST 081 Bismuth selenide doped with manganese, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Mn) 12068-69-8 View
BST 090 Bismuth selenide doped with copper, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cu) 12068-69-8 View
BST 099 Bismuth selenide doped with iron, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Fe) 12068-69-8 View
BST 108 Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Co) 12068-69-8 View
BST 117 Bismuth selenide doped with chromium, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cr) 12068-69-8 View
BST 126 Bismuth selenide doped with nickel, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Ni) 12068-69-8 View
C 0121 Cobalt sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-48-4 View
C 0265 Chromium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99% 7440-47-3 View
C 1051 Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-50-8 View
C 1098 Chromium sputtering target, diam. × thickness 2 in. × 3 mm, 99.99% 7440-47-3 View
C 3299 Chromium sputtering target 99.95% 3 inch dia x 2 mm thick 7440-47-3 View
C 3617 Chromium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-47-3 View
C 5095 Cobalt sputtering target, diam. x thickness 50.8 mm x 1 mm, 99.95% 7440-48-4 View
C 6567 Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99% 7440-50-8 View
C 6911 Cobalt sputtering target 99.95% 3 inch dia x 2 mm thick -
C 7347 Cobalt sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm , 99.9% 7440-48-4 View
C 7692 Copper sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9% 7440-50-8 View
F 3967 Fe33.3Co33.3Ni33.3 sputtering target 99.95%3 inch dia x 2 mm thick View
F 4599 Fe50Co50 sputtering target 99.95% 3 inch dia x 2 mm thick View
F 8001 Fe88Ga17 sputtering target 99.95% 3 inch dia x 2 mm thick View
F 8691 Fe75Ga25 sputtering target 99.95% 3 inch dia x 2 mm thick -
G 0369 Gold sputtering target, diam. × thickness 2 in. × 0.25 in, 99.99% 7440-57-5 View
G 0396 Gold sputtering target, diam. × thickness 2 in. × 0.125 in, 99.99% 7440-57-5 View
G 0621 Gold sputtering target, diam. × thickness 2 in. × 3 mm, 99.99% 7440-57-5 View
G 0626 Gold sputtering target, diam. × thickness 50 mm × 1 mm, 99.99% 7440-57-5 View
G 0915 Gold sputtering target, diam. × thickness 50 mm × 2 mm, 99.99% 7440-57-5 View
G 0933 Gold sputtering target 99.95% 3 inch dia x 0.5 mm thick 7440-57-5 View
G 0991 Gold sputtering target, diam. × thickness 50.8 mm × 3 mm, 99.99% 7440-57-5 View
G 5679 G 5679 View
G 7777 Gold sputtering target, diam. × thickness 2 in. × 1.5 mm, 99.9% 7440-57-5 View
G 8412 Gold sputtering target, diam. × thickness 25.4 mm × 0.2 mm, 99.99% 7440-57-5 View
H 0488 Hafnium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-58-6 View
I 0628 Iron sputtering target, diam. x thickness 50.8 mm x 0.75 mm, 99.95% 7439-89-6 View
I 0658 Indium sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm , 99.9% 7440-74-6 View
I 0747 Iron sputtering target, diam. x thickness 50 mm x 6 mm, 99.99% 7439-89-6 View
I 1256 Iron sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7439-89-6 View