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Sputtering targets

Sputtering targets


A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips. As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.

Otto Chemie Pvt Ltd - Manufacturers of Sputtering targets in India.



Features:



From standard, single element materials to custom compounds, small circular to Multiple Tile and stepped constructions, and commercial grade to ultra-high purities.  We utilize a variety of specialized processing techniques such as hot pressing, hot isostatic pressing (HIP), and cold isostatic pressing (CIP), induction vacuum melting, and vacuum casting to produce homogenous, fine-grained, high-density materials that conform to the strictest application standards. Otto Chemie Pvt Ltd a complete range of sputtering target materials including precious metals, pure metals, alloys, ceramics, cermet, boride, oxides, carbides, nitrides, silicates, and fluorides



Purities range from commercial-grade (99.5%) to ultra-high (99.9999%)



Backing plates used in the sputtering process are essential to creating a quality thin film deposition for your product. We offer to backplates in both standard configurations and custom dimensions to meet your specific requirements. We also offer complete bonding services to provide a complete solution

1. Pure Metal Sputtering Target

Al, Sb, Bi, B, CD, C, Ce, Cr, Co, Cu, Dy, Er, Eu, Gd, Ge, Au, C, Hf, Ho, In, Ir, Fe, La, Lu, Mg, Mn, Mo, Nd, Ni, Nb, Pd, Pt, Pr,Re, Ru, Sm, Se, Sc, Ag, SI, Ta, Tb, Tm, Sn, Ti, W, V, Yb, Y, Zr, Zn, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc,Y



2. Alloy Sputtering Target

AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB, CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr, DyFe,DyFeCo, FeB, FeC, FeMn, GdFe, GdFeCo, HfFe, IrMn, IrRe, InSn, MoSi, NiAl, NiCr, NiCrSi, NdDyFeCo, NiFe, NiMn, NiNbTi,NiTi, NiV, SmCo, AgCu, AgSn, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiAl, TiNi, TiCr, WRe, WTi, WCu, ZrAl, ZrCu, ZrFe,ZrNb, ZrNi, ZrTi, ZrY, ZnAl, ZnMg



3. Oxide sputtering Target or ceramic target

Al2O3, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2,Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr,(TiO2) 2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO: Al, ZrO2 (unstabilized) , ZrO2-5-15wt% CaO)



4. Metal boride sputtering Target:

Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2



5. Metal Carbide Sputtering Target:

B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC



6. Fluoride sputtering Target

AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6, SrF2, ThF4, YF3, YbF3



7. Nitride Sputtering Target

AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN



8. Selenide sputtering Target

Bi2Se3, CdSe, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe



9. Silicide Sputtering Target

Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2

Sputtering targets

1 to 50 of 169 item(s) displayed

Code Product Name CAS No. MSDS Pricing
A 0611 Aluminium sputtering target, diam. x thickness 50.6 mm × 3 mm, 99.99% 7429-90-5 View
A 3614 Aluminium sputtering target, diam. x thickness 50.8 mm × 3 mm, 99.99% 7429-90-5 View
A 6091 Aluminium sputtering target, 3 inch dia x 2 mm thick, 99.95% 7429-90-5 View
A 6499 Aluminium sputtering target, diam. x thickness 50 mm × 5 mm, 99.99% 7429-90-5 View
A 7770 Aluminium sputtering target 99.99%, (L x W x Thick 200 x 125 x 3 mm) 7429-90-5 View
A 8154 Aluminium zinc oxide sputtering target, diam. × thickness 50.8 mm × 3 mm 37275-76-6 View
B 0916 Boron sputtering target, diam. x thickness 4 inch × 3 mm, ≥99.9% 7440-42-8 View
B 8812 Boron sputtering target bonded with Indium (In) dia x thickness 2 inch × 3 mm, ≥99.9% View
BST 009 Bismuth selenide, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% 12068-69-8 View
BST 018 Bismuth selenide doped with manganese, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Mn) 12068-69-8 View
BST 027 Bismuth selenide doped with copper, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cu) 12068-69-8 View
BST 036 Bismuth selenide doped with iron, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Fe) 12068-69-8 View
BST 045 Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Co) 12068-69-8 View
BST 054 Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cr) 12068-69-8 View
BST 063 Bismuth selenide doped with nickel, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Ni) 12068-69-8 View
BST 072 Bismuth selenide, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% 12068-69-8 View
BST 081 Bismuth selenide doped with manganese, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Mn) 12068-69-8 View
BST 090 Bismuth selenide doped with copper, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cu) 12068-69-8 View
BST 099 Bismuth selenide doped with iron, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Fe) 12068-69-8 View
BST 108 Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Co) 12068-69-8 View
BST 117 Bismuth selenide doped with chromium, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cr) 12068-69-8 View
BST 126 Bismuth selenide doped with nickel, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Ni) 12068-69-8 View
BST 770 Bismuth selenide, sputtering target, diam. × thickness 2 inch × 3 mm, 99.99% 12068-69-8 View
C 0121 Cobalt sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-48-4 View
C 0265 Chromium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99% 7440-47-3 View
C 0470 Copper sputtering target, diam. x thickness 2 inch x 3 mm, 99% 7440-50-8 View
C 0821 Chromium sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.95% View
C 1051 Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-50-8 View
C 1098 Chromium sputtering target, diam. × thickness 2 in. × 3 mm, 99.99% 7440-47-3 View
C 3299 Chromium sputtering target 99.95% 3 inch dia x 2 mm thick 7440-47-3 View
C 3617 Chromium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% 7440-47-3 View
C 3708 CrSi 91.1/8.9at% target, 50.8 mm dia. x 5 mm thick, 99.9% (Indium bonded to 1 mm thick copper backing plate) View
C 4724 Chromium sputtering target, diam. × thickness 2 inch × 3 mm, 99.9% 7440-47-3 View
C 5095 Cobalt sputtering target, diam. x thickness 50.8 mm x 1 mm, 99.95% 7440-48-4 View
C 6567 Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99% 7440-50-8 View
C 6911 Cobalt sputtering target 99.95% 3 inch dia x 2 mm thick -
C 7347 Cobalt sputtering target, diam. x thickness 25.4mm (1.0in) x 1 mm , 99.9% 7440-48-4 View
C 7415 Cobalt sputtering target, diam. x thickness 4 inch x 4 mm, 99.99% 7440-48-4 View
C 7577 Copper sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.99% 7440-50-8 View
C 7659 Cobalt sputtering target, diam. x thickness 2 inch x 1 mm, 99.99% 7440-48-4 View
C 7692 Copper sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9% 7440-50-8 View
C 8841 Co76Si14B10 alloy sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9% View
F 3967 Fe33.3Co33.3Ni33.3 sputtering target 99.95%3 inch dia x 2 mm thick View
F 4599 Fe50Co50 sputtering target 99.95% 3 inch dia x 2 mm thick View
F 5822 FeCo alloy sputtering target diam. x thickness 2 inch × 1.5 mm, ≥99.9% View
F 8001 Fe88Ga17 sputtering target 99.95% 3 inch dia x 2 mm thick View
F 8141 Fe38 Co38Si14B10 alloy sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9% View
F 8691 Fe75Ga25 sputtering target 99.95% 3 inch dia x 2 mm thick -
F 8811 Fe76Si14B10 alloy sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9% View
F 8822 Fe40Co40B20 alloy sputtering target diam. x thickness 2 inch × 1.5 mm, ≥99.9% View

DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received.
Not for medical, household or any other uses, for lab use only, Please test before use.