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Kindly note: Due to ongoing raw material / metal shortages and market price volatility, all orders including those placed online will be subject to reconfirmation by our sales team, including revised pricing and delivery dates. We appreciate your understanding.
Synonyms: Boron amorphous
Boron is a metalloid chemical element with symbol B and atomic number 5.Bonding : Target should be elastomer bonded with OFHC copper backing plate 0.125” thick, diameter 4” with 8-32 (M4) threaded hole at the centre of the backing plate. Max Power density : 20Watts/square inch
B 0916 (OTTO) Boron sputtering target, diam. x thickness 4 inch × 3 mm, ≥99.9% Cas 7440-42-8 - used in chemical compounds.
Symbol GHS07 GHS07
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-25-7
Tantalum, sputtering target, 99.95% (L x W x Thick 14 x 1 x 2 mm)
1344-28-1
Aluminium oxide (Substrate N type) (GaN templates), 10 x 10mm, Orientation (0001)
7446-07-3
Tellurium oxide, 99.99%
7758-95-4
Lead(II) chloride, 99.999%
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.