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Copper is a chemical element with symbol Cu. It is a soft, malleable and ductile metal with very high thermal and electrical conductivity.
C 6567 (OTTO) Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99% - used mostly as a pure metal, but when greater hardness is required
RIDADR UN 3077 9 / PGIII
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7782-40-3
Diamond powder, 0-1 μm
7440-32-6
Titanium sputtering target, diam. × thickness 250 mm × 3 mm, 99.95%
Stainless steel - AISI 304, Fe/Cr18%/Ni 10%, plate, thickness 4.2 mm, size 1220 × 610 mm, temper annealed
7440-31-5
Tin sputtering target, diam. x thickness 2 inch x 0.250 inch, 99.999%
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.