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Copper is a chemical element with symbol Cu. It is a soft, malleable and ductile metal with very high thermal and electrical conductivity.
C 6567 (OTTO) Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99% - used mostly as a pure metal, but when greater hardness is required
RIDADR UN 3077 9 / PGIII
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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9004-34-6
Cellulose microcrystalline, for TLC
Magnesium oxide sputtering target dia x thickness 2 inch × 2 mm, ≥99.9%
1309-48-4
Magnesium oxide, (single crystal substrate), 10 x 10 x 0.2 mm, Orientation <100>
147-14-8
Copper(II) phthalocyanine, 99%
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.