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M 8227 (OTTO) Molybdenum sputtering target, diam. x thickness 3 inch x 2.5 mm, 99.95% Cas 7439-98-7 - used in electronic and semiconductor application.
WGK Germany 3
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
409-21-2
Silicon carbide (4H-SiC) wafers, dia 100 mm, thick 1.0 mm
18472-89-4
Cresyl violet
7782-42-5
Graphite flakes, 99% carbon basis, +50 mesh particle size (≥80%), natural
7440-18-8
Ruthenium sputtering target 3 inch dia x 2 mm thick, ≥99.95%
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.