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N 8060 (OTTOKEMI) Niobium Tin sputtering target, diam. x thickness 3 inch × 0.25 inch, 99.9% - used in chemical research.
WGK 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
62306-27-8
Polycarbomethylsilane, average Mw ~1500-2500
409-21-2
Silicon carbide (4H-SiC) wafers, dia 100 mm, thick 1.0 mm
9004-34-6
Cellulose powder, for column chromatography
12024-21-4
Gallium oxide, single crystal substrates, 10 mm x 10 mm x 0.6 mm, <100>
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.