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M 0241 (OTTOKEMI) Magnesium oxide sputtering target dia x thickness 2 inch × 2 mm, ≥99.9% - used in chemical research.
WGK 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7704-34-9
Sulphur powder, 99.5%
Tantalum pentoxide sputtering target (ti doped), diam. × thickness 152.4 mm x 6.4 mm with indium bonded 0.2 mm copper backing plate diam. x thickness 140 mm × 15 mm, 99.95%
Fe50Co50 sputtering target 99.95% 3 inch dia x 2 mm thick
121461-69-6
Pyrromethene 556
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.