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Kindly note: Due to ongoing raw material / metal shortages and market price volatility, all orders including those placed online will be subject to reconfirmation by our sales team, including revised pricing and delivery dates. We appreciate your understanding.
M 0241 (OTTOKEMI) Magnesium oxide sputtering target dia x thickness 2 inch × 2 mm, ≥99.9% - used in chemical research.
WGK 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-36-0
Antimony sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.999%, with bonded Copper (Cu) backing plate of thickness 3 mm
Stellitee 21 powder, 53-150 µm
7440-47-3
Chromium sputtering target, diam. × thickness 2 inch × 3 mm, 99.99%
7440-21-3
Silicon wafer (single substrase), <100>, p-type, contains Boron (B) as dopant, diam. × thickness 2 in. × 0.1 mm
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.