Aluminium oxide sputtering target, diam. x thickness 4 inch x 6 mm, 99.99%
: Aluminium oxide is an amphoteric substance, meaning it can react with both acids and bases, such as hydrofluoric acid and sodium hydroxide, acting as an acid with a base and a base with an acid, neutralising the other and producing a salt.
: A 3077 (OTTOKEMI) Aluminium oxide sputtering target, diam. x thickness 4 inch x 6 mm, 99.99% Cas 1344-28-1 - used in Physical Vapor Deposition (PVD) to deposit thin, insulating, and highly durable ceramic films.
Properties
Safety Information
RIDADR NONH for all modes of transport
WGK Germany nwg
RTECS BD1200000
| Packings | Price (INR) |
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1 pc
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POR
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