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Silicon wafer, <100>, p-type, contains Boron (B) as dopant, diam. x thickness 150 mm x 320 μm

Code: SSW 108
PRIME

90019090

Container / Standard Cassettes
18%
PRIME

90019090


Container / Standard Cassettes

18%
PackingsPrice (INR)
1 pc POR
10 pc POR
Custom size POR
Packings
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Properties
Silicon high purity

<100>

± 0.5°

150 mm

± 0.2 mm

320 μm (0.320 mm)

± 15 μm

Boron as dopant

p-Type

5000-9000 Ωcm

Front side miror polished, No secondary flat

{110} ± 1 ° as per SEMI standard

10 μm

30 μm

57.5 ± 2.5 mm

FZ

None

Description

Single crystal sapphire has a unique combination of physical, chemical and optical properties allowing it to withstand high temperatures, high pressure, thermal shock, and water or sand erosion

Application

SSW 108 (OTTO) Silicon wafer, <100>, p-type, contains Boron (B) as dopant, diam. x thickness 150 mm x 320 μm - used for hybrid microelectronic applications requiring a uniform dielectric constant and highly insulating characteristics, photoelectronic applications, including the high brightness LED market.

Safety Information

WGK Germany 2


RTECS VW0400000

Documentation

Certificate Of Analysis

(For eg. B 1615-0108)

Other Documents

For any quries, please write to us at

qc@ottokemi.com
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received.
Not for medical, household or any other uses, for lab use only, Please test before use.


PackingsPrice (INR)
1 pc POR
10 pc POR
Custom size POR