Kindly note: Due to ongoing raw material / metal shortages and market price volatility, all orders including those placed online will be subject to reconfirmation by our sales team, including revised pricing and delivery dates. We appreciate your understanding.
M 3069 (OTTOKEMI) Magnesium oxide sputtering target dia x thickness 3 inch × 2 mm, ≥99.95% used in chemical research.
WGK 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-05-3
Palladium sputtering target, dia. x thickness 2.00" x 0.125", 99.995%
7440-47-3
Chromium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
FeCo alloy sputtering target diam. x thickness 2 inch × 1.5 mm, ≥99.9%
Fe88Ga17 sputtering target 99.95% 3 inch dia x 2 mm thick
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.