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Kindly note: Due to ongoing raw material / metal shortages and market price volatility, all orders including those placed online will be subject to reconfirmation by our sales team, including revised pricing and delivery dates. We appreciate your understanding.
Common substrate for III-V nitrides as well as many other epitaxial films.
WGK Germany nwg
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-33-7
Tungsten sputtering target, diam. x thickness 1 inch x 0.125 inch, 99.95%
70131-67-8
Poly(dimethylsiloxane), hydroxy terminated average Mn ~550, viscosity ~25 cSt
7681-65-4
Copper(I) iodide, 99.999%
7440-21-3
Silicon wafer (single substrase), <100>, n-type, contains Arsenic as dopant, diam. × thickness 4 in. × 0.2 mm
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.