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Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with the molecular formula N(CH3)4+ OH−.
T 1477 (OTTO) Tetramethylammonium hydroxide 1M solution in water Cas 75-59-2 - used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
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NA
Cobalt AAS standard solution 1000 mg/L Co in diluted HCl traceable to NIST
88-89-1
Picric acid, saturated solution
50-01-1
Guanidine hydrochloride, for molecular biology, 99.5%
71-36-3
Butyl alcohol, natural, ≥99.5%
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