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Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with the molecular formula N(CH3)4+ OH−.
T 1477 (OTTO) Tetramethylammonium hydroxide 1M solution in water Cas 75-59-2 - used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
WGK 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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2386-54-1
Butane sulphonic acid sodium salt, anhydrous, for HPLC 98%+
Parafilm M4 4 in × 125 ft
7681-11-0
Potassium iodide 1M solution
68988-92-1
Wright stain solution
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.