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Magnesium oxide is an excellent single-crystal substrate for thin films of ferromagnetic, photo-electronic, and high Tc superconductor materials.
MSC 774 (OTTO) Magnesium oxide wafer, <100>, diam. × thickness 2 in x 0.5 mm - used widely as substrates for various thin film applications.
WGK Germany 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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7440-42-8
Boron sputtering target, diam. x thickness 4 inch × 3 mm, ≥99.9%
7440-21-3
Silicon wafer (single side polished) <100>
7440-22-4
Silver sputtering target, diam. × thickness 57 mm × 1.0 mm, 99.99%
7440-47-3
Chromium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99%
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.