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Magnesium oxide is an excellent single-crystal substrate for thin films of ferromagnetic, photo-electronic, and high Tc superconductor materials.
WGK Germany 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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Silicon wafer (single substrase), <100>, p-type, contains Boron (B) as dopant, diam. x thickness 100 mm x 0.525 mm
Fluorine doped tin oxide coated glass slide L × W × D 100 mm × 100 mm × 2.3 mm, surface resistivity ~7 Ω/sq
Vanadium sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9%
Stainless steel - AISI 304 rod, Fe/Cr18%/Ni 10%, 40 mm dia, length 1500 mm
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