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Synonyms: lanthanum aluminate - strontium aluminium tantalate
LSAT crystal substrate for epitaxial thin films in ferroelectric and high temperature superconductor devices.
LSAT is primarily used in its single crystal form, typically as thin (≤1 mm) wafers. These wafers are used as a common substrate for epitaxial growth of thin films.
WGK Germany 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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Trimethoxy(3,3,3-trifluoropropyl)silane, 97%
Fe76Si14B10 alloy sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9%
1309-48-4
Magnesium oxide, (single crystal substrate), 10 x 10 x 1.0 mm, Orientation : < 100>+/-0.3degree
7440-25-7
Tantalum, sputtering target, diam. x thickness 1 inch x 0.125 inch, 99.95%
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