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Fused silica is the key starting material for opticals
FS018 (OTTO) Fused silica wafers dia 100 mm thick 1 mm - used for telecommunications.
Safety Information for this product is unavailable at this time.
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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12063-98-8
Gallium phosphide wafers, <100>, diam. x thickness 50.8mm. x 0.45 mm
Barium fluoride window diam. x thick 8 mm x 1.5 mm
Substrate Glass Wafers (100 mm x 100 mm x 0.2 mm)
1303-00-0
Gallium arsenide (GaAs substrate), <001>, diam. × thickness 2” (50.8 mm) × 0.35 mm
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.