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Octafluoropropane (C3F8) is a fluorocarbon non-flammable greenhouse gas that can be produced either by electrochemical fluorination or by the Fowler process using cobalt fluoride
O 0116 (OTTO) Octafluoropropane, 99.5% Cas 76-19-7 - used as a plasma etching material for SiO2 layers in semiconductor applications, as oxides are selectively etched versus their metal substrates.