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Fused silica is the key starting material for opticals
FS036 (OTTO) Fused silica wafers dia 100 mm thick 0.25 mm - used for telecommunications.
Safety Information for this product is unavailable at this time.
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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Fluorescence Bandpass Filters (25mm Dia, 520nm CWL)
Platinized silicon wafer, dia 100 mm, thick 350-500 μm
7440-21-3
Silicon wafer, <100>, P-type, contains boron as dopant, diam. × thickness 4 in x 525 μm
Laser Grade Mirror, 50.8 mm Dia (Reflectivity 50%)
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.