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CFC-116, Perfluoroethane
H 0813
puriss
CF3CF3.
18%
76-16-4
99%
138.01.
Bottle / Drum
Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon.
Hexafluoroethane is a fluorocarbon counterpart to the hydrocarbon ethane. It is a non-flammable gas negligibly soluble in water and slightly soluble in alcohol.
Organic building blocks, Fluorinated building blocks
Gas
5.734
Hazard Codes : XiSafety Statements : 38RIDADR : UN 2193 2.2WGK Germany : 3RTECS : KI4110000
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. For laboratory use only. Not for drug, medical, household, or any other unauthorized application. We assume no liability for misuse or unauthorized application of the product. Please test before use.