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S 0243
Si
28046900
18%
7440-21-3
28.09
Bottle / Drum
S 0243 (OTTO) Silicon sputtering target, diam. × thickness 50 mm × 6 mm, 99.99% - used for the production of the silicon, sputtering is widely used to produce a back reflector layer (made predominantly with aluminum) and front contacts (made with transparent conducting oxides, TCO).
Silicon wafers or a “slice” of substrate find applications in the fabrication of integrated circuits, solar cells etc. They serve as a substrate for various microelectronic devices.
Materials science, Sputtering targets
99.99%
Solid
50 mm
± 1%
6 mm
WGK Germany 2
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. For laboratory use only. Not for drug, medical, household, or any other unauthorized application. We assume no liability for misuse or unauthorized application of the product. Please test before use.